Table of Contents
Page(s) | Article Title | Author(s) |
1995-1996 | Device Photolithography: Forward | Blecher, Franklin H. |
1997-2009 | Device Photolithography: An Overview of the New Mask-Making System | Howland, F.L.; Poole, K.M. |
2011-2029 | Device Photolithography: Computer Systems for Pattern Generator Control | Gross, A.G.; Raamot, J.; Watkins, Mrs. S.B. |
2031 | Device Photolithography: The Primary Pattern Generator: Introduction | Poole, K.M. |
2033-2041 | Device Photolithography: The Primary Pattern Generator: Part I - Optical Design | Cowan, M.J.; Herriott, D.R.; Johnson, A.M.; Zacharias, A. |
2043-2059 | Device Photolithography: The Primary Pattern Generator: Part II - Mechanical Design | Kossyk, G.J.W.; Laico, J.P.; Rongved, L.; Stafford, J.W. |
2061-2067 | Device Photolithography: The Primary Pattern Generator: Part III - The Control System | Dowd, P.G.; Cowan, M.J.; Rosenfeld, P.E.; Zacharias, A. |
2069-2075 | Device Photolithography: The Primary Pattern Generator: Part IV - Alignment and Performance Evaluation | Johnson, A.M.; Zacharias, A. |
2077-2094 | Device Photolithography: The Electron Beam Pattern Generator | Samaroo, W.; Raamot, J.; Parry, P.; Robertson, G. |
2095-2104 | Device Photolithography: Electron-Sensitive Materials | Broyde, Barret |
2105-2116 | Device Photolithography: Lenses for the Photolithographic System | Herriott, Donald R. |
2117-2128 | Device Photolithography: Reduction Cameras: Optical Design and Adjustment | Rawson, Eric G. |
2129-2143 | Device Photolithography: Reduction Cameras: Mechanical Design of the 3.5Xand 1.4X Reduction Cameras | Poulsen, M.E.; Stafford, J.W. |
2145-2177 | Device Photolithography: The Step-and-Repeat Camera | Alles, D.S.; Elek, J.W.; Howland, F.L.; Nevis, B.; Nielsen, R.J.; Schlegel, W.A.; Skinner, J.G.; Stout, C.E. Jr. |
2179-2192 | Device Photolithography: Thin Photosensitive Materials | Kerwin, R.E. |
2193-2202 | Device Photolithography: A Computer Controlled Coordinate Measuring Machine | Ashley, F.R.; Murphy, Miss E.B.; Savard, H.J. Jr. |
2203-2220 | Device Photolithography: The Mask Shop Information System | Brinsfield, Mrs. J.G.; Pardee, S. |
2221-2248 | Response of Periodically Varying Systems to Shot Noise - Application to Switched RC Circuits | Rice, S.O. |
2249-2265 | A New Approach for Evaluating the Error Probability in the Presence of Intersymbol Interference and Additive Gaussian Noise | Ho, E.Y.; Yeh, Y.S. |
2267-2287 | Upper Bound on the Efficiency of dc-Constrained Codes | Chien, Ta-Mu |
2289-2302 | Pull-In Range of a Phase-Locked Loop With a Binary Phase Comparator | Oberst, James F. |
2303-2310 | A Fast Method of Generating Digital Random Numbers | Rader, C.M.; Rabiner, L.R.; Schafer, R.W. |
2311-2348 | Nonorthogonal Optical Waveguides and Resonators | Arnaud, J.A. |
2349-2376 | Optical Resonators With Variable Reflectivity Mirrors | Zucker, H. |
2377-2403 | Projecting Filters for Recursive Prediction of Discrete-Time Processes | Gersho, Allen; Goodman, David J. |
2405-2415 | Contributors to this Issue | |